Dynastrip DL7630光刻胶去除剂
Dynastrip DL7630光刻胶去除剂去除干法金属蚀刻工艺中的光刻胶和蚀刻后残留物
Dynastrip DL7630光刻胶去除剂在焊料凸块工艺中溶解负性光刻胶
Dynastrip DL7630光刻胶去除剂用于单晶片清洁工艺
Removes photoresist and post-etch residue from dry metal etch processes
Dissolves negative photoresist in solder bumping processes
For use in single-wafer clean processes
标签:
Dynastrip DL7630
