Dynastrip AP7880-NA和Dynastri AP7880-NT光刻胶去除剂
Dynastri AP7880-NT光刻胶去除剂经验证的专利去除技术,用于去除高级包装和铜柱工艺中使用的厚光刻胶
Dynastri AP7880-NT光刻胶去除剂经验证的专利去除技术,用于去除高级包装和铜柱工艺中使用的厚光刻胶
Dynastrip AP7880-NA和Dynastri AP7880-NT光刻胶去除剂
•Dynastri AP7880-NT光刻胶去除剂经验证的专利去除技术,用于去除高级包装和铜柱工艺中使用的厚光刻胶
•Dynastri AP7880-NT光刻胶去除剂去除厚厚的负干膜或厚厚的正或负旋光致抗蚀剂
•Dynaloy高端AP7880-C的低成本版本
•亚太市场提供Dynastrip AP7880-NT
•北美市场提供Dynastrip AP7880-NA
Dynastrip AP7880-NA and Dynastrip AP7880-NT
• Proven and patented removal technology, formulated for removal of thick photoresist used in advanced packaging and Cu pillar processes
• Removes thick-negative dry film or thick-positive or negative spin on photoresist
• Lower cost version of Dynaloy’s premium AP7880-C
• Dynastrip AP7880-NT available in Asia Pacific market
• Dynastrip AP7880-NA available in North American market